00934nam a2200205 c 4500001001300000005001500013008004100028041001300069049003200082052001300114056001100127082001400138100003600152245021200188260004200400300003000442502007600472653016000548963002000708KDM20010107220010212164719010212s1999    tjka       CB 000   kor  0 akorbeng0 lEM2237582lEM2237583c2fDP01a553b1-1  a553240 a621.42211 a조원국,d1966-0KAC20170181010a증착률 균일화를 위한 화학증착 반응로에서 운전조건 및 형상 최적화에 관한 연구=xOperating condition and shape optimization of a CVD reactor for uniform film growth/d조원국  a대전:b한국과학기술원,c1999  axv, 156p.:b삽도;c26cm1 a학위논문(박사) --b한국과학기술원:c기계공학과,d1999  a증착률a균일화a화학증착a반응로a운전조건a형상최적화aOPERATINGaCONDITIONaSHAPEaOPTIMIZATIONaCVDaREACTORaUNIFORMaFILM GROWTH  a기계공학과