01027nam a2200217 c 4500001001500000005001500015008004100030040001900071041001300090049003200103052002200135056001400157082001600171100003600187245027500223260004200498300002900540502007600569653014400645963002000789KDM199832695  19981222104530981222s1998    tjka       CB 000   kor    a011001c0110010 akorbeng0 lEM1761905lEM1761906c2fDP01a530.48b전837ㄱ  a530.48240 a620.1982211 a전병혁,d1970-0KAC20170699610a극자외선 리소그래피 하부 무반사층용 fluorinated silicon nitride 박막의 제조 및 특성분석=xFabrication and characterization of fluorinated silicon nitride thin film for the bottom antireflective layer in deep ultraviolet lithog raphy/d전병혁  a대전:b한국과학기술원,c1998  axv,158p.:b삽도;c26cm1 a학위논문(박사) --b한국과학기술원:c재료공학과,d1998  a극자외선a리소그래피a무반사층aFLUORINATEDaSILICONaNITRIDEa박막aFILMaANTIREFLECTIVEaLAYERaULTRAVIOLETaLITHOGaRAPHY  a재료공학과