00799nam a2200217 a 4500001001300000005001500013008004100028049001700069052002100086082001800107100004800125245010400173260005300277300002900330502005500359504005400414650002800468650002700496900002900523900002900552WDM20070194220210927134638070731s2001    us a          000   eng  0 lWM517246fDP02a621.38152bC545i0 a621.381522211 a최병덕,g崔炳悳,d1964-0KAC20160767310aIron contamination in silicon and its impact on ultra-thin gate oxide integrity/dby Byoung D. Choi  aAnn Arbor, MI:bUMI Dissertation Services,c2001  axi, 86 p.:bill.;c23 cm1 aThesis(Ph.D.) --bArizona State University,d2001.  aIncludes bibliographical references (p. [78]-86). 4aElectrical engineering. 4aSurface contamination.10aChoe, Byeongdeok,d1964-10aChoi, Byoungdeog,d1964-