01115nam a2200229 k 4500001001500000005001500015008004100030040001900071041001300090049003000103052001900133056001400152082001600166100004800182245026400230260007100494300003600565502007300601653017500674900001900849963001700868KDM199520895  20201012084734950831s1994    tjkaf      CB 000   eng    a011001c0110010 aengbkor0 lWM182874lWM182875c2fDP02a537.622bL477p  a427.62230 a537.6222191 a이창우,g李昶雨,d1964-0KAC20180550910aPhysical properties and thermal stabilities of tungsten nitride diffusion barrier produced by plasma enhanced chemical vapor deposition=x플라즈마 화학 증착된 질화 텅스텐 확산 방지막의 물리적 특성 및 열 적 안정성/dChang Woo Lee  a대전:bKorea Advanced Institute of Science and Technology,c1994  aiv,151 p,:bill., plates;c26cm1 a학위논문(박사) --b한국과학기술원:c물리학과,d1994  aTHERMALaSTABILITIESaTUNGSTENaNITRIDEaDIFFUSIONaBARRIERaPLASMAaENHANCEDaCHEMICALaVAPORaDEPOSITIONa플라즈마a화학증착a질화a텅스텐a확산방지막10aLee, Chang-woo  a물리학과