00945nam a2200217 k 4500001001500000005001500015008004100030040001900071041001300090049003200103052002200135056001400157082001700171100004800188245017400236260004200410300003200452502008200484653013500566963002600701KDM199427930  20200724093557941212s1994    tjka       CB 000   kor    a011001c0110010 akorbeng0 lEM1178314lEM1178315c2fDP01a558.13b배894ㅂ  a558.13230 a629.13232191 a배귀남,g裵貴男,d1961-0KAC20161078610a반도체 웨이퍼상의 입자 침착속도의 측정 및 제어=xMeasurement and control of particle deposition velocity on a semiconductor wafer surface/d배귀남  a대전:b한국과학기술원,c1994  axiii,109장:b삽도;c26cm1 a학위논문(박사) --b한국과학기술원:c항공우주공학과,d1994  a반도체a웨이퍼상a입자a침착속도aMEASUREMENTaCONTROLaPARTICLEaDEPOSITIONaVELOCITYaSEMICONDUCTORaWAFERaSURFACE  a항공우주공학과