01068nam a2200205 k 4500001001300000005001500013008004100028041001300069049003200082052002200114056001400136082001500150100004800165245028800213260003600501300003000537502008600567653018300653963002600836KDM20003127020200909153645001010s2000    ulka       AK 000   kor  0 akorbeng0 lEM2080873lEM2080874c2fDP01a530.46b주196ㅊ  a530.46240 a620.142211 a주성재,g朱晟栽,d1970-0KAC20185042910a초고진공 전자공명 화학기상증착법으로 성장된 비정질 실리콘 박막의 구조적.광학적 특성=xStructural and optical properties of a-Si:H thin films grown by ultrahigh vacuum electron cyclotron resonance chemical vapor deposition (UHV-ECRCVD)/d주성재  a서울:b서울대학교,c2000  axiv,171p.:b삽도;c26cm1 a학위논문(박사) --b서울대학교 대학원:c무기재료공학과,d2000  a초고진공a전자공명a화학기상증착법a비정질a실리콘a박막aASIHaTHINaFILMSaULTRAHIGHaVACUUMaELECTRONaCYCLOTRONaRESONANCEaCHEMICALaVAPORaDEPOSITION  a무기재료공학과