01121nam a2200241 k 4500001001500000005001500015008004100030040001900071041001300090049003000103052002200133056001400155082001800169100004800187245025900235260003600494300003800530502008000568653016400648950002100812963002000833965002600853KDM199210364  20200811163222921117s1992    bnkaf      FC 000   kor    a011001c0110010 akorbeng0 lEM938043lEM938044c2fDP01a561.84b김193ㅈ  a561.84230 a621.381522191 a김광화,g金光和,d1956-0KAC20184376110a直交電磁界下의 放電 플라즈마에 의한 窒化 티타늄의 形成과 그 電氣的 特性에 관한 硏究=x(A)study on TiN deposition in the discharge plasma under electric cross magnetic field and its electrical characterisics/d金光和  a부산:b釜山大學校,c1992  aiii,134장:b삽도,도판;c26cm1 a학위논문(박사) --b釜山大學校 大學院:c電氣工學科,d1992  a직교전자a방전a플라즈마a질화a티타늄a전기aTINaDEPOSITIONaDISCHARGEaPLASMAaELECTRICaCROSSaMAGNETICaFIELDaELECTRICALaCHARACTERISICS1 a비매품b\6600  a전기공학과  a질화티타늄박막