00836nam a2200205 c 4500001001300000005001500013008004100028041001300069049003200082052001700114056001500131082001600146245016400162260003600326300004000362502009300402504002900495650005300524700005300577KDM20062633620200721155030060403s2005 tjkad MB 000 kor 0 akorbeng0 lEM3612066lEM3778096c2fDP01a530.495b6-3 a530.495240 a620.19522100aTiO₂계 묽은 자성반도체 박막의 제조 및 특성=xPreparation and properties of TiO₂-based diluted magnetic semiconductor thin films/d成洛眞 a대전:b忠南大學校,c2005 aix, 160 p.:b삽화, 도표;c26 cm1 a학위논문(박사) --b忠南大學校 大學院,c材料工學科 材料工學,d2005 a참고문헌: p. 142-146 8a자성 반도체[磁性半導體]0KSH19980099961 a성낙진,g成洛眞,d1973-0KAC2018493444aut