01032cam a22002771i 4500001001300000005001500013007000300028008004100031040003200072049001800104052001600122056001100138082001400149100003600163245007200199264004400271300004600315336002600361337002900387338002700416500002600443502011400469504003200583653012100615900001800736KDM20181926520200916105515ta170110s2017    ulka     m AL 000c  eng    a241026c011012d011001erda0 lWM874907fWDP02a620.5b18-4  a5302601a620.52231 a장해규,d1983-0KAC20186249810aPlasma process monitoring with multivariate analysis /dHaegyu Jang 1aSeoul :bSungkyunkwan University,c2017  a106 pages :bcolor illustrations ;c30 cm  atextbtxt2rdacontent  aunmediatedbnc2rdamedia  avolumebnc2rdacarrier  aAdviser: Heeyeop Chae1 aThesis(Ph.D.) --bGraduate School, Sungkyunkwan University,cDepartment of Nano Science and Technology,d2017  aBibliography: pages 103-106  aPlasma MonitoringaEtching Endpoint Detection (EPD)aFault DetectionaPrincipal Component AnalysisaCluster Analysis10aChae, Heeyeop