01395nam a2200361 k 4500001001300000005001500013008004100028020003100069035001800100041001300118049002800131052001500159056001300174082001800187245009300205246004600298260003300344300003000377500004800407504003300455650006600488653018700554700004400741700001800785700004800803900003000851900003000881900002200911900002200933900003000955900003700985950001101022KMO20041838920210705144107040623s2004    ulka          001   kor    a8989559367g93560:c\19000  aUB200402124471 akorheng0 lEM3069471lEM3069472c201a569.4b4-6  a569.4240 a621.3815222100a반도체 집적 공정/dGary S.May;eSimon M.Sze [공]지음;e곽계달...[등]옮김19aFundamentals of semiconductor fabrication  a서울:b학술정보,c2004  axv, 333p.:b삽도;c26cm  a권말부록으로 '기호목록'등 수록  a참고문헌과 색인수록 8a반도체 집적 회로[半導體集積回路]0KSH2000031119  a반도체집적공정aFUNDAMENTALaSEMICONDUCTORaFABRICATIONa회로a반도체집적회로a반도체공정a반도체a직접회로a소자a박막증착a박막a반도체소자1 aMay, Gary S.,d1964-0KAC2004038794aut1 aSze, Simon M.1 a곽계달,g郭桂達,d1950-0KAC20151109710a메이, 게리 S.,d1964-10a메이, 가리 S.,d1964-10a스제, 시몬 M.10a스즈, 시몬 M.10aMay, Gary Stephen,d1964-10a메이, 게리 스티븐,d1964-0 b\19000