01247nam a2200325 i 4500001001300000005001500013007000300028008004100031040002400072041001300096049003100109052002200140056001400162082001900176100004800195245023100243260003700474264003700511300004500548336002600593337002800619338002700647500002800674502010200702504003100804546003400835900001800869900002000887900001400907KDM20152110720200917152923ta151106s2015    ulka     m AC 000   eng    a011001c011001erda0 aengbkor0 lWM806476lWM806477c2fWDP02a621.381528b15-15  a569.432601a621.3815282231 a석혜원,g石惠援,d1983-0KAC20186264610aInfluence of pulsed substrate bias voltage on the properties of sputtered thin films =xRF 마그네트론 스퍼터링을 이용한 박막 제조 시 기판상에 pulsed DC 바이어스 전압의 인가 영향 /dHye Won Seok  aSeoul :bKorea University,c2015 1aSeoul :bKorea University,c2015  axi, 113 leaves :billustrations ;c26 cm  atextbtxt2rdacontent  aunmediatedbn2rdamedia  avolumebnc2rdacarrier  aAdviser: Byeong-Kwon Ju1 aThesis(Ph.D.) --bGraduate School, Korea University,cDepartment of Electrical Engineering,d2015  aBibliography: leaves 92-98  aIn English; summary in Korean10aSeo, Hye Wonk10aJu, Byeong-Kwon10a주병권