01277nam a2200265 c 4500001001300000005001500013007000300028008004100031040001100072041001300083052003300096245025000129300002400379545007900403545009900482545006200581653009300643700001900736700004800755700001400803773014000817900001700957900001900974900001800993KSI00089047420111005170451ta110805s2006    ulk           000   kor    a0110010 akorbeng01a547.05b한547ㅎc3(1)-3(4)00a클린룸 환경에서 가열되는 회전 반도체 웨이퍼로의 입자침착 수치해석 =xNumerical analysis on particle deposition onto a heated rotating semiconductor wafer in clean room environment /d송근수,e유경훈,e이건형  ap. 170-179 ;c26 cm  a송근수, 한국생산기술연구원 에어로졸·오염제어연구실  a유경훈, 한국생산기술연구원 에어로졸·오염제어연구실bkhyoo@kitech.re.kr  a이건형, 삼성전자(주) 반도체총괄 기술센터  aRotating waferaWafer diameteraThermophoresisaFlow fieldaParticle deposition velocity1 a송근수4aut1 a유경훈,g兪京勳,d1965-0KAC2017456171 a이건형0 t한국실내환경학회지.d한국실내환경학회.g3권 2호(2006년 6월), p. 170-179q3:2<170w(011001)KSE200402363,x1738-412510aSong, Gunsoo10aYoo, Kyunghoon10aLee, Kunhyung