01766nam a2200349 c 4500001001300000005001500013007000300028008004100031040001100072041001300083052003600096245027800132300002400410545011000434545006800544545005100612545007600663545007300739545008800812653012300900700001901023700004801042700004801090700001801138700001501156700004801171773013001219900001701349900001601366900001601382900001801398KSI00077487420091021100719ta090704s2007    ulk           000   kor    a0110010 akorbeng01a530.405b한596ㅎc17(5)-17(8)00a플라즈마 포커스를 이용한 크롬 산화물 박막 성장의 분위기 기체 압력 의존성 연구 =xDependence of gas pressure on Cr oxide thin film growth using a plasma focus device /d정규호,e이재갑,e임현식,eL. Karpinski,eM. Scholz,e이전국  ap. 308-312 ;c30 cm  a정규호, 동국대학교 반도체 과학과, Institute of Plasma Physics and Laser Microfusion (IPPLM)  a이재갑, 한국과학기술연구원 박막재료연구센터  a임현식, 동국대학교 반도체 과학과  aL. Karpinski, Institute of Plasma Physics and Laser Microfusion (IPPLM)  aM. Scholz, Institute of Plasma Physics and Laser Microfusion (IPPLM)  a이전국, 한국과학기술연구원 박막재료연구센터bjkleemc@kist.re.kr  a플라즈마 포커스a크롬 산화물aPlasma focusaIon emissionaDepositionaCr oxide thin filmaWorking pressure1 a정규호4aut1 a이재갑,g李在甲,d1963-0KAC2018462871 a임현식,g林賢植,d1969-0KAC2018489661 aKarpinski, L.1 aScholz, M.1 a이전국,g李銓國,d1958-0KAC2017005170 t한국재료학회지.d韓國材料學會.g17권 6호(2007년 6월), p. 308-312q17:6<308w(011001)KSE199509224,x1225-056210aJung, Kyooho10aLee, Jaekap10aIm, Hyunsik10aLee, Jeonkook