01089nam a2200205 c 4500001001300000005001500013008004100028040001100069052002900080245016800109300002100277545009300298545006600391653016800457700005300625700003600678773013300714900001900847900001700866KSI00064115820071004134144070813s2002    ulk           000   kor    a01100101a555.05b한613ㅈc19(8)00aUV를 이용한 giga급 반도체 제조공정상의 오염제어기술=xContamination control by UV in giga-grade semiconductor processes/d유경훈,e김용진  ap. 16-25;c26 cm  a유경훈, 한국생산기술연구원 에어로졸·필터연구실bkhyoo@kitech.re.kr  a김용진, 한국기계연구원 열유체시스템 연구부  a오염제어a자외선a광전자a광촉매a반도체 제조공정aContamination controlaUVaPhotoelectronaPhotocatalystaSemiconductor manufacturing process1 a유경훈,g兪京勳,d1965-0KAC2017456174aut1 a김용진,d1961-0KAC2018380990 t한국정밀공학회지.d한국정밀공학회.g19卷 8號(2002년 8월), p. 16-25q19:8<16w(011001)KSE199508376,x1225-907110aYoo, Kyunghoon10aKim, Yongjin