01318nam a2200313 c 4500001001300000005001500013008004100028040001100069041001300080052003600093245018900129300002300318545004700341545004700388545007100435545004700506653009700553700001900650700001400669700001400683700004800697773014500745856002000890856002100910900001600931900001800947900001900965900002000984KSI00058485520090408113031070410s2005    ulk           000   kor    a0110010 akorbeng01a559.705b대445ㄷc43(1)-43(4)00aCu(Mg) 박막의 time dependent dielectric breakdown 특성 평가=xTime dependent dielectric breakdown characteristics of Cu(Mg) films/d안정욱,e황상수,e박영배,e주영창  ap. 125-131;c30 cm  a안정욱, 서울대학교 재료공학부  a황상수, 서울대학교 재료공학부  a박영배, 안동대학교 신소재공학부bybpark@andong.ac.kr  a주영창, 서울대학교 재료공학부  aCu(Mg)aReliabilityaTime dependence dielectric breakdownaTime to failureaCu drifta박막1 a안정욱4aut1 a황상수1 a박영배1 a주영창,g朱永昶,d1965-0KAC2018378560 t대한금속·재료학회지.d대한금속.재료학회.g43권 2호(2005년 2월), p. 125-131q43:2<125w(011001)KSE200000110,x1738-822840uT00000468329ad40u45030253aKd00010aAn, Jeonguk10aHwang, Sangsu10aPark, Youngbae10aJoo, Youngchang