01148nam a2200217 c 4500001001300000005001500013008004100028040001100069041001300080052003500093245022000128300002300348545011100371545005000482653013200532700004100664700001400705773017500719900001900894900001700913KSI00050764320060616165411060609s2003    ulk           000   kor    a0110010 akorbeng01a469.05b한428ㅎc13(1)-13(6)00a솔-젤 Dip Coating에 의한 Sb-doped SnO₂투명전도막의 제조 및 특성=xFabrication of Sb-doped SnO₂transparent conducting films by sol-gel dip coating and their characteristics/d임태영,e오근호  ap. 241-246;c29 cm  a임태영, 요업기술원유리 디스플레이팀, 한양대학교 세라믹공학과btylim@kicet.re.kr  a오근호, 한양대학교 세라믹공학과  aTransparent conducting thin filmaSol-gelaDip coatingaSb-doped SnO₂aSiO₂barrieraN₂annealinga솔-젤a투명전도막1 a임태영,d1958-0KAC2017228124aut1 a오근호0 tJournal of the Korean crystal growth and crystal technology.d韓國結晶成長學會.g13권 5호(2003년 10월), p. 241-246q13:5<241w(011001)KSE199508766,x1225-142910aLim, Tae-Young10aAuh, Keun-Ho