01151nam a2200229 c 4500001001300000005001500013008004100028040001100069041001300080052002600093245021500119300002100334545010800355545009400463653009400557700005300651700001400704700001200718773015500730900001800885900001800903KSI00053715720060726150819060721s2000    ulk           000   kor    a0110010 akorbeng01a405b국374ㄱc19(1)00a고집적소자에 응용되는 텅스텐-보론-질소 화합물 박막의 열적인 안정성=xThermally stable diffusion barrier of W-B-N thin films for high memory devices/d이창우,e고석중,eQ. Chen  ap. 61-68;c26 cm  a이창우, 국민대학교 자연과학대학 전자물리학전공 부교수bcwlee@phys.kookmin.ac.kr  aQ. Chen, School of Chemistry, University of St. Andrews, North Haughbqc@st-andrews.ac.uk  a고집적소자a텅스텐-보론-질소 화합물aW-B-N thin filmsaHigh memory devices1 a이창우,g李昶雨,d1964-0KAC2018055094aut1 a고석중1 aQ. Chen0 t(基礎科學硏究所)論文集-國民大學校.d國民大學校出版部.g19輯 1卷(2000년), p. 61-68q19:1<61w(011001)KSE199500678,x1226-000210aLee, Changwoo10aGho, Seokjung