01781nam a2200325 c 4500001001300000005001500013008004100028040001100069041001300080052002600093245027900119300001900398545006800417545006600485545013800551545014300689545006600832653013000898700002501028700004801053700004801101700001701149700003601166773017001202900001401372900001801386900001901404900001401423900001801437KSI00024265320040902194030040624s2002    jjk           000   eng    a0110010 aengbkor01a405b제578ㄱc15(1)01a(A)study on the influence of carbon contents on dielectric constant of SiOC films by thermal treatment=x탄소가 첨가된SiO₂박막의 열처리에 따른 탄소 농도 영향에 대한 연구/dChang Sil Yang,eYoung-Hun Yu,eKwang-Man Lee,eHeon-Ju Lee,eChi Kyu Choi  ap. 1-6;c27 cm  aChang Sil Yang, Department of Physics Cheju National University  aYoung-Hun Yu, Department of Physics Cheju National University  aKwang-Man Lee, Faculty of Electrical and Electronic Engineering, Research Institute of Advanced Technology, Cheju National University  aHeon-Ju Lee, Faculty of Mechanical, Energy and Production Egineering, Research Institute of Advanced Technology, Cheju National University  aChi Kyu Choi, Department of Physics Cheju National University  aCarbonaCarbon contentsaDielectric constantaSiOCaFilmsaThermal treatmenta탄소aSi<TEX>$$O_2$$</TEX>a열처리a박막1 aYang, Chang Sil4aut1 a유영훈,g劉榮勳,d1960-0KAC2017344391 a이광만,g李光萬,d1956-0KAC2018232891 aLee, Heon-Ju1 a최치규,d1947-0KAC2017079640 t基礎科學硏究-濟州大學校 基礎科學硏究所.d濟州大學校 基礎科學硏究所.g15卷 1號(2002), p. 1-6q15:1<1w(011001)KSE199507930,x1225-320010a양창실10aYu, Young-Hun10aLee, Kwang-Man10a이헌주10aChoi, Chi Kyu