01349nam a2200289 c 4500001001300000005001500013008004100028040001100069052002500080245015900105300002100264545006700285545008300352545006800435545009600503653008800599700004100687700001400728700001400742700003600756773017100792856002000963900001800983900001901001900001701020900002201037KSI00023319220040901194020040617s1995    jjk           000   eng    a01100101a405b제578ㄱc8(1)00aFormation and technology of SiOF films as intermetal dielectric by helicon wave plasma CVD/dChi Kyu Choi,eKwang Man Lee,eDuk-soo Kim,eHong-Young Chang  ap. 65-76;c27 cm  aChi Kyu Choi, Department of Physics, Cheju National University  aKwang Man Lee, Department of Electronic Engineering, Cheju National University  aDuk-soo Kim, Department of Chemistry, Cheju National University  aHong-Young Chang, Department of Physics, Korea Advanced Institute of Science and Technology  aFormationaTechnologyaSiOF filmsaIntermetalaDielectricaHelicon wave plasmaaCVD1 a최치규,d1947-0KAC2017079644aut1 a이광민1 a김덕수1 a장홍영,d1954-0KAC2018170180 t基礎科學硏究-濟州大學校 基礎科學硏究所.d濟州大學校 基礎科學硏究所.g8卷 1號(1995), p. 65-76q8:1<65w(011001)KSE199507930,x1225-320040u2029684aKd00210aChoi, Chi Kyu10aLee, Kwang Man10aKim, Duk-soo10aChang, Hong-Young