01210nam a2200301 c 4500001001300000005001500013008004100028040001100069041001300080052002800093245017000121300002300291545004000314545004000354545004000394545004000434653008600474700005300560700001400613700004800627700001400675773012200689856002000811900001700831900002000848900002100868900001900889KSI00034785820120522103343040913s1997    ulk           000   kor    a0110010 akorbeng01a570.05b한437ㄱc8(1)00a질산매질에서 UV 조사에 의한 옥살산 분해=xDecomposition of oxalic acid in nitric acid by UV radiation/d김응호,e김영환,e정동용,e유재형  ap. 108-113;c30 cm  a김응호, 한국원자력연구소  a김영환, 한국원자력연구소  a정동용, 한국원자력연구소  a유재형, 한국원자력연구소  a질산매질aUV 조사a옥살산 분해aOxalic acidaNitric acidaUV radiation1 a김응호,g金應鎬,d1952-0KAC2016351594aut1 a김영환1 a정동용,g鄭東龍,d1963-0KAC2017073861 a유재형0 t공업화학.d한국공업화학회.g8권 1호(1997년 2월), p. 108-113q8:1<108w(011001)KSE199508910,x1225-011240u3024223aKd00010aKim, Eung Ho10aKim, Young Hwan10aChung, Dong Yong10aYoo, Jae Hyung