01291nam a2200253 c 4500001001300000005001500013008004100028040001100069041001300080052002800093245022700121300002300348545006000371545006000431545004000491653016100531700005300692700001400745700004800759773017300807900001900980900001800999900002001017KSI00018636220040520195908040506s1999    ulk           000   kor    a0110010 akorbeng01a469.05b한428ㅎc9(6)00a데칸술폰이 삽입된 니켈 화합물의 층상 구조의 열적 성질=xThermal behavior of the layered structure of decanesulfonate intercalated into the hydrated nickel compound/d허영덕,e전태현,e박용준  ap. 580-584;c29 cm  a허영덕, 단국대학교 자연과학부 화학전공  a전태현, 단구대학교 자연과학부 화학전공  a박용준, 한국원자력연구소  a데칸술폰a니켈 화합물a층상구조a열적성질aThermalaBehavioraLayeredaStructureaDecanesulfonateaIntercalatedaHydratedaNickelaCompound1 a허영덕,g許永德,d1960-0KAC2017015934aut1 a전태현1 a박용준,g朴勇俊,d1957-0KAC2018383810 tJournal of the Korean crystal growth and crystal technology.d韓國結晶成長學會.g9권 6호(1999년 12월), p. 580-584q9:6<580w(011001)KSE199508766,x1225-142910aHuh, Young-Duk10aJun, Tae-Hyun10aPark, Yong-Joon