01967nam a2200445 c 4500001001300000005001500013008004100028040001100069041001300080052002500093245022300118300002300341545006300364545006300427545006300490545006300553545006300616545006300679545009700742545008100839653011000920700005301030700001401083700001401097700001401111700001401125700001401139700004801153700001401201773014201215856002001357900001601377900001701393900001901410900001901429900001801448900001801466900001901484900001801503KSI00024209720040701143400040624s1998    ggk           000   kor    a0110010 akorbeng01a505b한735ㄱc7(1)00a플라즈마 이온주입기에서의 시변환 쉬스 연구=xMeasurement of time-dependent sheath in plasma source ion implantation/d김곤호,e김건우,e최영도,e김종식,e김상진,e한승희,e홍문표  ap. 333-337;c26 cm  a김곤호, Department of Physics, Hanyang University-Ansan  a김건우, Department of Physics, Hanyang University-Ansan  a김영우, Department of Physics, Hanyang University-Ansan  a최영도, Department of Physics, Hanyang University-Ansan  a김종식, Department of Physics, Hanyang University-Ansan  a김상진, Department of Physics, Hanyang University-Ansan  a한승희, Advanced Analysis Center, Korea Institute of Science and Technology, Seoul, Korea  a홍문표, AMLCD Division, Samsung Electronics, Yongin-si, Kyunggi-do, Korea  a플라즈마a이온주입기a시변환a쉬스aTime-dependentaSheathaPlasma sourceaIon implantation1 a김곤호,g金坤鎬,d1960-0KAC2016377024aut1 a김건우1 a김영우1 a최영도1 a김종식1 a김상진1 a한승희,g韓承熙,d1957-0KAC2017325971 a홍문표0 t工學技術論文集-漢陽大學校.d漢陽大學校 出版院.g제7권 1호(1998년 8월), p. 333-337q7:1<333w(011001)KSE19960256440u3108615aKd00210aKim, Gon-Ho10aKim, Gun-Woo10aKim, Young-Woo10aChoi, Young-Do10aKim, Jong-Sik10aKim, Sang-Jin10aHan, Seung-Hee10aHong, Mun-Pyo