01071naa a2200265 c 4500001001300000005001500013008004100028040001100069052003300080245012600113300003200239545003600271545003700307545005000344545005400394653006400448700001900512700004800531700001700579700002100596773013300617856002000750900001700770900001800787KSI00011096320040101165045031203s1999    ulka          000   eng    a01100101a559.105b한572ㅇㅈc31(1)00aEtching reaction of UO₂ with CF₄/O₂ mixture gas plasma/dYongsoo Kim,eJinyoung Min,eKikwang Bae,eMyungseung Yang  ap. 133-138:b삽도;c26 cm  aYongsoo Kim, Hanyang University  aJinyoung Min, Hanyang University  aKikwang Bae, Atomic Energy Research Institute  aMyungseung Yang, Atomic Energy Research Institute  aEtchingaReactionaUO₂aCF₄aO₂aMixtureaGasaPlasma1 a김용수4aut1 a민진영,g閔鎭榮,d1966-0KAC2018438531 aBae, Kikwang1 aYang, Myungseung0 t원자력학회지.d한국원자력학회.g제31권 2호(1999년 4월), p. 133-138q31:4<133w(011001)KSE199508698,x0372-732740u3208272aKd00010aKim, Yongsoo10aMin, Jinyoung