01215nam a2200229 c 4500001001300000005001500013008004100028040001100069041001300080052003100093245022500124300003000349545007500379545007100454653016900525700005300694700001900747773017100766856002000937900001400957900001400971KSI00005475320040223132822031112s2000    ulka          000   eng    a0110010 aengbkor01a569.27405b한488ㅁc7(3)00aElectrical properties of interlayer low dielectric polyimide with electron cyclotron resonance etching process=xECR 식각 공정에 따른 층간절연막 폴리이미드의 전기적 특성/dSang Hoon Kim,eJinho Ahn  ap. 13-17:b삽도;c26 cm  aSang Hoon Kim, Deparment of Materials Engineering, hanyang university,  aJinho Ahn, Deparment of Materials Engineering, hanyang university,  aECRa식각공정a층간절연막a폴리이미드aElectricalaPropertiesaInterlayeraLowaDielectricaPolyimideaElectronaCyclotronaResonanceaEtching process1 a안진호,g安鎭浩,d1963-0KAC2018036704aut1 aKim, Sang Hoon0 t마이크로전자 및 패키징학회지.d한국마이크로전자 및 패키징학회.g7권 3호(2000년 9월), p. 13-17q7:3<13w(011001)KSE199900824,x1226-936040u3347883aKd00010a김상훈10a안진호