01642nam a2200325 c 4500001001300000005001500013008004100028040001100069041001300080052002900093245028200122300003200404545005000436545005000486545006200536545006200598545006200660653021600722700001900938700001400957700004800971700004801019700001401067773014601081900001801227900001701245900001801262900001701280900001901297KSI00017575120040225192513031010s1995    ulka          000   kor    a0110010 akorbeng01a569.205b한597ㅈc8(1)00a직교배열표를 쓴 remote-PECVD 산화막형성의 공정최적화 및 특성=xOptimization of remote plasma enhanced chemical vapor deposition oxide deposition process using orthogonal array table and properties/d김광호,e김제덕,a유병곤,e구진근,e김경수  ap. 171-175:b삽도;c26 cm  a김광호, 청주대학교 반도체공학과  a김제덕, 청주대학교 반도체공학과  a유병곤, 한국전자통신연구소 반도체연구단  a구진근, 한국전자통신연구소 반도체연구단  a김경수, 한국전자통신연구소 반도체연구단  a직교배열표a리모트 PECVDa실리콘 산화막a층간절연막a퇴적공정의 최적화aOrthogonal array tableaRemote PECVDaSillcon dioxideaIntermetal dielectricaOptimizstion of deopsition process1 a김광호4aut1 a김제덕1 a유병곤,g兪炳坤,d1957-0KAC2018211031 a구진근,g具珍根,d1956-0KAC2016372351 a김경수0 t電氣電子材料學會誌.d韓國電氣電子材料學會.g8券 2號(1995년 3월), p. 171-175q8:2<171w(011001)KSE199508720,x1225-668410aKim, Kwang Ho10aKim, Je Deok00aYu, Byung Gon10aKoo, Jin Gun10aKim, Kyung Soo