01080nam a2200217 c 4500001001300000005001500013008004100028040001100069041001300080052003500093245022600128300003200354545004700386545004700433653012600480700004500606700004800651773012800699900001800827900001700845KSI00016162220040209194245031216s2000    ulka          000   kor    a0110010 akorbeng01a554.9405b한622ㅎc9(1)-9(4)00aChemical Mechanical Polishing (CMP) 공정후의 금속오염의 제거를 위한 건식세정=xDry cleaning for metallic contaminants removal after the chemical mechanical polishing (CMP) process/d전부용,e이종무  ap. 102-109:b삽도;c26 cm  a전부용, 인하대학교 재료공학부  a이종무, 인하대학교 재료공학부  aChemicalaMechanicalaPolishingaCMPa금속오염a건식세정aDryaCleaningaMetallicaContaminantsaRemovalaProcess1 a전부용,g全富龍0KAC2020649244aut1 a이종무,g李鍾武,d1950-0KAC2018193310 t韓國眞空學會誌.d韓國眞空學會.g9권 2호(2000년 5월), p. 102-109q9:2<102w(011001)KSE199508370,x1225-882210aJeon, Bu-Yong10aLee, Chongmu