01094nam a2200253 c 4500001001300000005001500013008004100028040001100069041001300080052002800093245015300121300003000274545005500304545005800359545005800417653009200475700005300567700001400620700001400634773013500648900001900783900001900802900001900821KSI00016336620040212184011031216s1992    ulka          000   kor    a0110010 akorbeng01a569.05b대483c29(1.1)00a얇은 열산화-질화막의 특성평가=xEvaluation of Characteristics of Oxidized Thin LPCVD-Si₃N₄ Film/d丘庚完,e趙成佶,e洪鳳植  ap. 29-35:b삽도;c26 cm  a구경완, 정회원, 충청전문대학 전자과  a조성길, 정회원, 충청대학교 금속공학과  a홍봉식, 정회원, 충남대학교 전자공학과  a열산화-질화막aEvaluationaCharacteristicsaOxidizedaThinaLPCVD-Si₃N₄aFilm1 a구경완,g丘庚完,d1961-0KAC2016371534aut1 a조성길1 a홍봉식0 t電子工學會論文誌.A.d大韓電子工學會.g29卷 9號(1992년 9월), p. 29-35q29:9<29w(011001)KSE199508730,x1016-135X10aKoo, Kyung Wan10aCho, Seong Gil10aHong, Bong Sik