01287na  a2200253   4500001001300000005001500013008004100028040001100069041001300080052004000093245022200133300003400355545006700389545005900456545005000515653013300565700005300698700001400751700004800765773016100813900002100974900002000995900001801015KSI00005455220040207083345031010s2001    ulka          000   kor    a0110011 akorbeng01a569.205b한597ㅈㄱc14(9)-14(12)00a레이저 어블레이션에 의한 (Pb,La)TiO₃박막의 제작조건에 따른 특성=xCharacteristics of (Pb,La)TiO₃thin film by deposition condition of pulsed laser ablation/d박정흠,e박용욱,e마석범  ap. 1001-1007:b삽도;c26 cm  a박정흠, 김포대학 전자정보계열bjhpark@kimpo.ac.kr  a박용욱, 남서울대학교 전자정보통신학부  a마석범, 용인송담대학 전기설비과  a레이저a어블레이션aDielectric thin film capacitora(Pb,La)TiO₃thin filmsaPulsed laser depositionaIn-situ deposition1 a박정흠,g朴正欽,d1967-0KAC2018315824aut1 a박용욱1 a마석범,g馬碩範,d1962-0KAC2017212490 t전기전자재료학회논문지.d한국전기전자재료학회.gVol.14 no.12(2001년 12월), p. 1001-1007q14:12<1001w(011001)KSE199800338,x1226-794510aPark, Jeong-Heum10aPark, Yong-Wook10aMah, Suk-Beom