01179nam a2200253 c 4500001001300000005001500013008004100028040001100069041001300080052004000093245016300133300003200296545005700328545008300385545003400468653013000502700001900632700001400651700004800665773015800713900001700871900001900888900001800907KSI00005452920040207083342031010s2001    ulka          000   kor    a0110011 akorbeng01a569.205b한597ㅈㄱc14(9)-14(12)00a순차 증착에 의한 BSCCO 박막의 에피택셜 성장=xEpitaxial growth of BSCCO films by layer-by-layer deposition/d안준호,e박용필,e김정호  ap. 855-860:b삽도;c26 cm  a안준호, 광운대학교 대학원 전기공학과  a박용필, 동신대학교 전기전자공학부byppark@white.dongshinu.ac.kr  a김정호, 한국광기술원  a순차증착aBSCCOa박막aBi₂Sr₂Cu<TEX>$$O_x$$</TEX>(Bi-2201)thin filmaLayer-by-layer depositionaOzoneaBuffer layer1 a안준호4aut1 a박용필1 a김정호,g金正鎬,d1966-0KAC2018463640 t전기전자재료학회논문지.d한국전기전자재료학회.gVol.14 no.10(2001년 10월), p. 855-860q14:10<855w(011001)KSE199800338,x1226-794510aAhn, Joon-Ho10aPark, Yong-Pil10aKim, Jeong-Ho