01501na  a2200289   4500001001300000005001500013008004100028040001100069041001300080052004000093245023700133300003400370545008000404545006200484545006200546545006200608653016900670700004100839700001400880700003600894700004800930773016100978900001701139900002001156900001601176900001901192KSI00005438520040207083322031010s2000    ulka          000   kor    a0110010 akorbeng01a569.205b한597ㅈㄱc13(9)-13(12)00aN<TEX>$$i_{81}$$</TEX>F<TEX>$$e_{19}$$</TEX> 박막의 제조와 전자기특성=xFabrication and electromagnetic properties of N<TEX>$$i_{81}$$</TEX>F<TEX>$$e_{19}$$</TEX> thin films/d이원재,e백성관,e민복기,e송재성  ap. 1032-1038:b삽도;c26 cm  a이원재, 한국전기연구소 박형전기소자 T.F.Tbwjlee@keri.re.kr  a백성관, 한국전기연구소 박형전기소자 T.F.T  a민복기, 한국전기연구소 박형전기소자 T.F.T  a송재성, 한국전기연구소 박형전기소자 T.F.T  a박막a전자기aNiFeaEx-situ field annealingaIn-situ field depositionaMagnetoresistanceaAFMaSurface morphologyaN<TEX>$$i_{81}$$</TEX>F<TEX>$$e_{19}$$</TEX>1 a이원재,d1963-0KAC2018460404aut1 a백성관1 a민복기,d1959-0KAC2018438141 a송재성,g宋在成,d1956-0KAC2016376210 t전기전자재료학회논문지.d한국전기전자재료학회.gVol.13 no.12(2000년 12월), p. 1032-1038q13:12<1032w(011001)KSE199800338,x1226-794510aLee, Won-Jae10aPaek, Sung-Kwan10aMin, Bok-Ki10aSong, Jae-Sung