01254nam a2200277 c 4500001001300000005001500013008004100028040001100069041001300080052004000093245029500133300003200428545007600460653008600536700001900622700001400641700001400655700004800669700001400717773015800731900001800889900001600907900001700923900001700940900001900957KSI00005436420040207083319031010s2000    ulka          000   kor    a0110010 akorbeng01a569.205b한597ㅈㄱc13(9)-13(12)00aAttenuated phase shift mask에 광 근접 효과 보정을 적용한 고립 패턴의 해상 한계 분석=xResolution limit analysis of isolated patterns using optical proximity correction method with attenuated phase shift mask/d김종선,e오용호,e임성우,e고춘수,e이재철  ap. 901-907:b삽도;c26 cm  a김종선, 원광대학교 물리반도체학부bcontra74@popsmail.com  a보정a고립패턴aIsolated patternsaOptical lithographyaOPCaAttenuated PSM1 a김종선4aut1 a오용호1 a임성우1 a고춘수,g高春洙,d1963-0KAC2016369011 a이재철0 t전기전자재료학회논문지.d한국전기전자재료학회.gVol.13 no.11(2000년 11월), p. 901-907q13:11<901w(011001)KSE199800338,x1226-794510aKim, Jong-sun10aOh, Yong-Ho10aLim, Sungwoo10aGo, Chun Soo10aLee, Jai-Choel