01164nam a2200253 c 4500001001300000005001500013008004100028040001100069041001300080052003900093245018300132300003200315545006900347545004700416545004700463653011100510700005300621700001400674700001400688773015500702900001800857900001700875900001800892KSI00005414820040206083249031010s1999    ulka          000   kor    a0110010 akorbeng01a569.205b한597ㅈㄱc12(7)-12(9)00a소성공정에 의한 glass/silicon 계면특성변화에 관한 연구=xStudy on interfaces properties of glass/sillicon by firing profiles/d허창수,e김완태,e윤세욱  ap. 649-688:b삽도;c26 cm  a허창수, 인하대학교 전기공학과bcs@dragon.inha.ac.kr  a김완태, 인하대학교 전기공학과  a윤세욱, 인하대학교 전기공학과  a소성공정a계면특성변화aGlassaSiliconaZinc borosilicate glassaPassivationaFiringaC-V curves1 a허창수,g許昌洙,d1955-0KAC2018242254aut1 a김완태1 a윤세욱0 t전기전자재료학회논문지.d한국전기전자재료학회.gVol.12 no.8(1999년 8월), p. 679-688q12:8<672w(011001)KSE199800338,x1226-794510aHuh, Chang-Su10aKim, Wan-Tae10aYoon, Se-Wook