01365na  a2200253   4500001001300000005001500013008004100028040001100069041001300080052003300093245030900126300003200435545008500467545003800552545005400590653017800644700001900822700001400841700004800855773015800903900001601061900001601077900001801093KSI00005402420040205083232031010s1998    ulka          000   kor    a0110010 akorbeng01a569.205b한597ㅈㄱc11(7)00aRF 스퍼터링법에 의한 (S<TEX>$$r_{1-x}$$</TEX>C<TEX>$$a_x$$</TEX>)TiO₃ 세라믹 박막의 미세구조 및 유전특성=xMicrostructure and dielectric properties of (S<TEX>$$r_{1-x}$$</TEX>C<TEX>$$a_x$$</TEX>)TiO₃ ceramic thin film by RF sputtering method/d김진사,e오재한,e이준웅  ap. 984-989:b삽도;c26 cm  a김진사, 광운대학교 공대 전기공학과bJoonung@daisy.kwangwoon.ac.kr  a오재한, 성화대학 전기과  a이준웅, 광운대학교 공대 전기공학과  aRF 스퍼터링a세라믹박막a선배향a유전상수a박막a유전완화aPreferred orientationaMicrostructureaDielectric constantaThin filmaDielectric relaxation1 a김진사4aut1 a오재한1 a이준웅,g李準雄,d1940-0KAC2018424140 t전기전자재료학회논문지.d한국전기전자재료학회.gVol.11 no.11(1998년 11월), p. 984-989q11:11<984w(011001)KSE199800338,x1226-794510aKim, Jin-Sa10aOh, Jea-Han10aLee, Joon-Ung