01441nam a2200265 c 4500001001300000005001500013008004100028040001100069041001300080052003500093245025400128246004400382300003000426545008800456545006800544545006800612653019600680700005300876700004800929700001400977773012600991900001801117900001901135900002101154KSI00002263920080509143726031017s2001    ulka          000   kor    a0110010 akorbeng01a431.4705b한597ㅈc4(1)-4(4)00a다공성 그물구조 음극을 이용한 구리 전착에 관한 연구.n2,p유기첨가제 PEG, MPS의 영향=xElectrodeposition of copper on porous reticular cathode, Effect of PEG and MPS on throwing power/d이관희,e이화영,e정원용30aEffect of PEG and MPS on throwing power  ap. 41-46:b삽도;c29 cm  a이관희, 한국과학기술연구원 금속공정연구센터bkwanhyi@kist.re.kr  a이화영, 한국과학기술연구원 금속공정연구센터  a정원용, 한국과학기술연구원 금속공정연구센터  a다공성a그물a그물구조a구조a음극a구리a구리전착a전착a유기첨가제aPEGaMPSaEffectaThrowing poweraElectrodepositionaCopperaPorous reticular cathodeaAdditive1 a이관희,g李寬熙,d1973-0KAC2018499154aut1 a이화영,g李華永,d1957-0KAC2018462811 a정원용0 t전기화학회지.d한국전기화학회.gVol.4 No.2(2001년 5월), p. 41-46q4:2<41w(011001)KSE199901118,x1229-193510aLee, Kwan Hyi10aLee, Hwa Young10aJeung, Won Young