00880nam a2200217 c 4500001001500000005001500015008004100030040001900071041001300090049003200103052002400135056001600159082001800175100004800193245016500241260003600406300003100442502008300473653008300556963002300639KDM199928903 19991006101609991006s1999 ulka AX 000 kor  a011001c0110010 akorbeng0 lEM1936096lEM1936097c2fDP01a559.1251b민968ㅇ a559.1251240 a621.483352211 a민진영,g閔鎭榮,d1966-0KAC20184385310aRF 플라즈마를 이용한 이산화우라늄(UO₂) 건식 식각 반응 연구=x(A)study on dry etching of uranium dioxide (UO₂) in RF plasma/d민진영 a서울:b한양대학교,c1999 avii,124장:b삽도;c26cm1 a학위논문(박사) --b한양대학교 대학원:c원자력공학과,d1999 aRFa플라즈마a이산화우라늄aUO₂aETCHINGaURANIUMaDIOXIDEaPLASMA a원자력공학과